arc-plasma

基本解釋

Diamond films were deposited by means of the high current extended DC arc plasma CVD technique.
并在浸蝕過(guò)的硬質(zhì)合金襯底上,用強(qiáng)電流直流伸展電弧等離子體CVD法沉積金剛石涂層。
The main results as follows:1. The magnetized arc plasma produced distinct stimulating effects for the wheat, tomato and soybean.
磁化弧光等離子體對(duì)小麥、番茄、大豆三種作物具有明顯的刺激效應(yīng)。
The pure nickel nanopowders were prepared by DC arc plasma evaporation method using self-designed and fabricated experimental apparatus.
采用自行研制的試驗(yàn)裝置,用直流電弧等離子體蒸發(fā)法制備了高純度的納米鎳粉。
The main work includes: 1.Large area high quality freestanding diamond thick films have been prepared by DC arc plasma jet CVD apparatus.
所完成的主要工作包括:1.;采用直流電弧等離子體噴射法沉積了較大面積的高質(zhì)量金剛石自支撐厚膜;
Nanocrystalline free-standing diamond films were deposited by 30kW DC Arc Plasma Jet CVD method on Molybdenum substrate with mixed fed gasses of Argon, Hydrogen and Methane.
在30kW級(jí)DC Arc Plasma Jet CVD(直流電弧等離子體噴射化學(xué)氣相沉積)設(shè)備上,采用Ar-H2-CH4混合氣體,在Mo的襯底上沉積出納米金剛石自支撐膜。