sputtering target
基本解釋
- 濺射靶
英漢例句
- Uses: sputtering target, physical vapor deposition, high temperature alloys.
濺射靶材、物理氣相沉積、高溫合金。 - Uses: sputtering target, physical vapor deposition, high temperature alloy for high-voltage vacuum switch contacts and precision alloy additives.
用途：濺射靶材、物理氣相沉積、高溫合金、用于高壓真空開(kāi)關(guān)觸頭及精密合金添加劑。 - The traditional upper limit of magnetic induction density B parallel to target surface in rectangular planar magnetron sputtering target has been increased by analyzing, designing and experimenting.
通過(guò)理論分析、實(shí)際設(shè)計(jì)和實(shí)驗(yàn)，對(duì)矩形平面磁控濺射靶表面水平磁感應(yīng)強(qiáng)度B的傳統(tǒng)取值上限進(jìn)行了拓展。
dictall.com
雙語(yǔ)例句
詞組短語(yǔ)
- CIGS sputtering targets 銅銦鎵硒濺射靶材
- alloy sputtering targets 合金濺射靶
- Molybdenum alloy sputtering targets 鉬合金濺射靶材
- Omat Sputtering Targets 歐萊濺射靶材
- High purity molybdenum sputtering targets 高純鉬濺射靶材
短語(yǔ)
專業(yè)釋義
- 濺射靶