low pressure chemical vapor deposition

基本解釋

The traditional ways to obtain polycrystalline film include solid phase crystallization (SPC), low pressure chemical vapor deposition (LPCVD) and excimer laser annealing (ELA).
目前常用的幾種獲得多晶薄膜的方法包括：低壓化學氣相沉積、固相結(jié)晶、準分子激光晶化等。
http://chazidian.com
Ultra-high Vacuum Chemical Vapor Deposition (UHVCVD) was a good choice, it provided a super clean, low temperature, low pressure ambient, and controlled thin films' growth precisely.
超高真空化學氣相沉積（UHVCVD）具有超淨的生長環(huán)境、能夠在低溫、低壓下生長鍺矽材料，可精確控制薄膜生長等優(yōu)點。
Diamond thin films were successfully deposited on single - crystal Si substrate at low pressure by a homemade equipment of electron cyclotron resonance chemical vapor deposition (ECRCVD) .
採用國內(nèi)研制的電子廻鏇共振化學氣相沉積（ECRCVD）設(shè)備，在單晶矽襯底上沉積了金剛石薄膜。