sputter deposition

基本解釋

The method comprises cleaning treatment of the graphite substrate and a technical process of magnetron sputtering deposition.
所述的石墨襯底的清潔処理，是將石墨襯底生長(zhǎng)麪機(jī)械拋光；
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And other PVD methods, such as sputtering deposition, ion beam assisted deposition, and pulsed laser deposition, are also used to prepare BCN thin films.
同時(shí)，各種PVD方法也被用來(lái)制備硼碳氮薄膜，如濺射法、離子束輔助沉積和脈沖激光沉積等。
This design aims at the characteristics of magnetron sputtering deposition, and mainly ameliorate the design of the chamber of the magnetron sputtering machine.
本設(shè)計(jì)主要對(duì)磁控濺射鍍膜機(jī)真空室進(jìn)行改進(jìn)設(shè)計(jì)，以改善磁控濺射鍍膜的工藝條件。設(shè)計(jì)內(nèi)容包括真空室及相關(guān)機(jī)搆設(shè)計(jì)、計(jì)算。