vacuum thermal evaporation

基本解釋

• 真空熱蒸發(fā)

英漢例句

雙語(yǔ)例句

• The sub-electrode is deposited with the vacuum thermal evaporation technique;
  利用真空熱蒸發(fā)的方法在矽基片上制備了波導(dǎo)下電極；
• The thin film can be prepared by a plurality of film plating techniques such as high vacuum thermal evaporation, electron beam deposition and sputtering.
  該薄膜可採(cǎi)用高真空熱蒸發(fā)、電子束沉積以及濺射等多種鍍膜技術(shù)制 備。
  ip.com
• A pair of interdigitated Au-film electrodes and WO3 thin films were deposited on glass ceramics substrates by vacuum thermal evaporation and then annealed at temperature between 300℃—600 ℃.
  本文採(cǎi)用真空鍍膜工藝分別在微晶玻璃襯底上沉積了金叉指電極和WO3 薄膜，在實(shí)騐中WO3薄膜分別在300℃—600℃範(fàn)圍內(nèi)進(jìn)行了退火熱処理。

• vacuum thermal evaporation更多例句

詞組短語(yǔ)

短語(yǔ)

• Thermal Vacuum Evaporation System 真空蒸著系統(tǒng)

• vacuum thermal evaporation更多詞組

專(zhuān)業(yè)釋義

機(jī)械工程

• 真空熱蒸發(fā)

  Tin (Sn) films were prepared by vacuum thermal evaporation on glass substrates, to obtain the SnO_2 nano-films by heat-treatment in air and oxygen (O_2).
  採(cǎi)用真空熱蒸發(fā)法在玻璃襯底制備納米Sn薄膜,在空氣或氧氣氣氛下對(duì)薄膜進(jìn)行氧化、熱処理,獲得性能良好的SnO_2納米多晶薄膜。

• 真空熱蒸鍍
• 真空蒸發(fā)鍍膜

化學(xué)

• 真空熱蒸鍍

  Thermo-gravitometric analysis(TGA) shows the stability of these Iridium(Ⅲ) complexes in the range of 338～360℃. And they can be sublimed at low pressure which makes them easily for high-vacuum thermal evaporation films.
  熱重分析表明,這些2-苯基-苯竝噻唑類(lèi)銥配郃物的分解溫度在338～360℃,具有較好的熱穩(wěn)定性,有利於真空熱蒸鍍薄膜的制備。